Chemical Vapour Deposition
A method of depositing thin semiconductor films.
With this method, a substrate is exposed to one or more vaporized compounds, one or more of which contain desirable constituents. A chemical reaction is initiated, at or near the substrate surface, to produce the desired material that will condense on the substrate.
This atomistic deposition method can provide highly pure materials with structural control at atomic or nanometer scale level.
It can produce single layer, multilayer, composite, nanostructured, and functionally graded coating materials with well controlled dimension and unique structure at low processing temperatures.
K.L. Choy, "Chemical vapour deposition of coatings", Progress in Materials Science, Volume 48, Issue 2, 2003, Pages 57-170